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High-temperature oxidation of ion-plated TiN and TiAIN films (1)

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http://journals.cambridge.orgDownloaded:13Mar2015IPaddress:132.174.254.159High-temperatureoxidationofion-platedTiNandTiAINfilmsHiroshiIchimuraandAtsuoKawanaSumitomoMetalMiningCo.,Ltd.,CentralResearchLaboratory18-5,3Chome,NakakokubunIchikawa272,Japan(Received8October1992;accepted14December1992)Thehigh-temperatureoxidationofTiN,Tio.9Alo.1N,andTio.6Alo.4Nfilmswhichweredepositedontostainlesssteelsubstratesusinganarcion-platingapparatuswasstudiedattemperaturesrangingfrom923to1173Kfor0.6to60ksinair.Theoxidationrateobtainedfrommassgainasafunctionoftimewasfoundtofitwelltoaparabolictimedependence.Fromtheirtemperaturedependence,theapparentactivationenergiesofoxidationweredetermined.WithincreasingAlcontents,theoxidationratedecreased,andtheactivationenergiesofoxidationreactionincreased.FormedoxidelayerswereanalyzedbyXRD,SEM,andEPMA.WithincreasedAlcontentinTiAINfilms,therate-determiningstepchangesfromoxygeniondiffusioninformedrutiletooxygenoraluminumiondiffusionintheformedAI2O3layer.I.INTRODUCTION

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